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Pfeiffer Vacuum, one of the world’s leading suppliers of vacuum technology, is introducing new compact Roots pumps with high pumping speeds. These Roots pumps from the HiLobe series cover a wide range of applications that call for large chambers to be evacuated rapidly. Potential uses in numerous industrial vacuum applications include electron beam welding, vacuum furnaces, freeze drying and, particularly, rapid evacuations (lock chambers or leak detection systems). These vacuum pumps are also suitable for use in coating applications. With their individual speed control, they can be adapted to customer-specific requirements.
As Andreas Würz, product manager at Pfeiffer Vacuum, explains, “We are pleased to round off the HiLobe series with the market launch of these large Roots pumps. These new Roots pumps handle a wide range of nominal pumping speeds up to 13,600 m³/hr. We are particularly proud of their very compact size and significantly lower power consumption compared to conventional Roots pumps.”
With their powerful drive concept, they shorten pump-down times by around 20% compared to conventional Roots pumps. Rapid evacuation also saves costs and increases the efficiency of production systems. The use of energy-efficient drives and the optimized rotor geometries of the pumps reduces energy costs by more than 50% compared to conventional Roots pumps. This is also reinforced by the sealing concept.
The pumps are hermetically sealed from the atmosphere. Dynamic seals are eliminated, thus making maintenance necessary only every four years.
The intelligent interface technology of the HiLobe ensures optimal process adjustment and condition monitoring. Condition monitoring provides information on the state of the vacuum system at all times. Condition monitoring also increases system availability since maintenance and service work can be planned expediently and with foresight to prevent cost-intensive production downtimes. These advantages result in a long service life and very high operational reliability.
In addition to individual components, Pfeiffer Vacuum offers a broad range of Roots pumping stations featuring different backing pumps, gradations, and accessories. Roots pumping stations such as these are used in low- and medium-vacuum applications, and are reliable solutions offering high pumping speeds in the transition range (from atmospheric pressure to 10-3 hPa). The right combination of different vacuum pumps creates the ideal solution for diverse applications in production and research.
